Dr. Himani Jain

Materialwissenschaft und Werkstofftechnik Hartmetall & Nitride Dünnschichttechnology

Wissenschaftliche Mitarbeiterin


JournalArticle
  • S. Sharma
  • Himani Jain
  • M. Kulkarni
  • G. Patil
  • B. Bhattacharya
  • A. Sharma
PZT–PDMS composite for active damping of vibrations , vol77
  • 2013

DOI: 10.1016/j.compscitech.2013.01.004

A Lead Zirconate-Titanate (PZT)/poly-dimethylsiloxane (PDMS) based flexible composite is synthesized and investigated for its potential in significantly enhancing the vibration damping capability along with its tunable properties. Rheologically and functionally different PZT/PDMS composites are prepared by dispersing different volume fractions of piezoelectric soft/hard PZT and Fe particles in a cross-linked PDMS matrix. It is observed that passive damping increases with increase in the soft PZT volume fraction from 0 to 0.32. This effect becomes more prominent after poling the composite at optimum conditions. The loss factor depends on the viscoelastic properties of the PDMS, homo and hetero-particle connectivity in the composite, and polarization and localization of the PZT particles in composite. Rheological analysis of the composite shows that the material loss factor (tan δ) increases linearly from ∼0.3 to 0.75 along with a broadening of the peak when the PZT volume fraction is increased from 0 to 0.32. Maximum structural damping (η) is obtained at 0.32 (V/V) of the soft-PZT as measured by the Oberst beam technique. This effect becomes more pronounced after a poling treatment. The X-ray diffraction results indicate that the dispersed PZT particles in PDMS matrix have the lattice parameters of a = 5.84 Å, c = 14.41 Å and (0 0 1) orientation. Further, after poling treatment, the dielectric constant and the piezoelectric coefficient (d33) for soft (submicron) PZT filler particles in PDMS matrix tend to be higher than those for hard PZT. The soft PZT/PDMS composite shows better performance as a damper than the hard, PZT composite.
JournalArticle
  • S. Sharma
  • Himani Jain
  • M. Kulkarni
  • G. Patil
  • B. Bhattacharya
  • A. Sharma
PZT–PDMS composite for active damping of vibrations , vol77
  • 2013

DOI: 10.1016/j.compscitech.2013.01.004

A Lead Zirconate-Titanate (PZT)/poly-dimethylsiloxane (PDMS) based flexible composite is synthesized and investigated for its potential in significantly enhancing the vibration damping capability along with its tunable properties. Rheologically and functionally different PZT/PDMS composites are prepared by dispersing different volume fractions of piezoelectric soft/hard PZT and Fe particles in a cross-linked PDMS matrix. It is observed that passive damping increases with increase in the soft PZT volume fraction from 0 to 0.32. This effect becomes more prominent after poling the composite at optimum conditions. The loss factor depends on the viscoelastic properties of the PDMS, homo and hetero-particle connectivity in the composite, and polarization and localization of the PZT particles in composite. Rheological analysis of the composite shows that the material loss factor (tan δ) increases linearly from ∼0.3 to 0.75 along with a broadening of the peak when the PZT volume fraction is increased from 0 to 0.32. Maximum structural damping (η) is obtained at 0.32 (V/V) of the soft-PZT as measured by the Oberst beam technique. This effect becomes more pronounced after a poling treatment. The X-ray diffraction results indicate that the dispersed PZT particles in PDMS matrix have the lattice parameters of a = 5.84 Å, c = 14.41 Å and (0 0 1) orientation. Further, after poling treatment, the dielectric constant and the piezoelectric coefficient (d33) for soft (submicron) PZT filler particles in PDMS matrix tend to be higher than those for hard PZT. The soft PZT/PDMS composite shows better performance as a damper than the hard, PZT composite.
JournalArticle
  • Himani Jain
  • H. Karacuban
  • D. Krix
  • H.-W. Becker
  • H. Nienhaus
  • V. Buck
Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor , vol49
  • 2011

DOI: 10.1016/j.carbon.2011.07.002

Well aligned carbon nanowalls, a few nanometers thick, were fabricated by continuous flow of aluminum acetylacetonate (Al(acac)3) without a catalyst, and independent of substrate material. The nanowalls were grown on Si, and steel substrates using inductively coupled plasma-enhanced chemical vapor deposition. Deposition parameters like flow of argon gas and substrate temperature were correlated with the growth of carbon nanowalls. For a high flow of argon carrier gas, an increased amount of aluminum in the film and a reduced lateral size of the carbon walls were found. The aluminum is present inside the carbon nanowall matrix in the form of well crystallized nanosized Al4C3 precipitates.
Contribution
  • Himani Jain
  • N. Hartmann
  • V. Buch
  • P. Serbun
  • A. Navitski
  • G. Müller
Electron emission of laser-structured carbon nanowalls on Si and stainless steel substrates
  • 2011
Contribution
  • Himani Jain
  • N. Hartmann
  • V. Buch
  • P. Serbun
  • A. Navitski
  • G. Müller
Electron emission of laser-structured carbon nanowalls on Si and stainless steel substrates
  • 2011
JournalArticle
  • Himani Jain
  • H. Karacuban
  • D. Krix
  • H.-W. Becker
  • H. Nienhaus
  • V. Buck
Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor , vol49
  • 2011

DOI: 10.1016/j.carbon.2011.07.002

Well aligned carbon nanowalls, a few nanometers thick, were fabricated by continuous flow of aluminum acetylacetonate (Al(acac)3) without a catalyst, and independent of substrate material. The nanowalls were grown on Si, and steel substrates using inductively coupled plasma-enhanced chemical vapor deposition. Deposition parameters like flow of argon gas and substrate temperature were correlated with the growth of carbon nanowalls. For a high flow of argon carrier gas, an increased amount of aluminum in the film and a reduced lateral size of the carbon walls were found. The aluminum is present inside the carbon nanowall matrix in the form of well crystallized nanosized Al4C3 precipitates.
Contribution
  • Himani Jain
Modification of PMMA with DLC using RF-PECVD
  • 2009
Contribution
  • Himani Jain
Study of Al doped diamond like carbon films deposited by ICP-CVD using Metal Organic Precursors
  • 2009
JournalArticle
  • P. Barhai
  • R. Sharma
  • A. Yadav
  • A. Singh
  • Himani Jain
  • V. Buck
Surface modification of PMMA with DLC using RF-PECVD , vol25 (216th ECS Meeting, Vienna, Austria)
  • 2009

DOI: 10.1149/1.3207673

DLC films are deposited on PMMA substrates using Radio Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD) technique with the variation of RF power at a constant pressure of 5 × 10-2 mbar. Acetylene diluted with argon is used as a precursor for the deposition of DLC films. No external heating is provided during deposition. Deposited films are characterized using Raman spectroscopy, FTIR spectroscopy, Optical contact angle (OCA) technique and AFM. Raman spectra shows a G peak near 1550 cm-1 and a D peak near 1320 cm-1. FTIR spectra shows a peak near 2900 cm-1 corresponding to C-H stretching modes and peaks below 2000 cm-1 corresponding to C-C modes and C-H bending modes. Surface morphology of the films has been studied with AFM and the result shows the formation of uniform films. Optical contact angle (OCA) shows that DLC coated PMMA is more hydrophobic compared to uncoated surface.
Contribution
  • Himani Jain
Deposition of Polycrystalline Alumina by Plasma Enhanced CVD from Metal-organic Precursors
  • 2009
JournalArticle
  • P. Barhai
  • R. Sharma
  • A. Yadav
  • A. Singh
  • Himani Jain
  • V. Buck
Surface modification of PMMA with DLC using RF-PECVD , vol25 (216th ECS Meeting, Vienna, Austria)
  • 2009

DOI: 10.1149/1.3207673

DLC films are deposited on PMMA substrates using Radio Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD) technique with the variation of RF power at a constant pressure of 5 × 10-2 mbar. Acetylene diluted with argon is used as a precursor for the deposition of DLC films. No external heating is provided during deposition. Deposited films are characterized using Raman spectroscopy, FTIR spectroscopy, Optical contact angle (OCA) technique and AFM. Raman spectra shows a G peak near 1550 cm-1 and a D peak near 1320 cm-1. FTIR spectra shows a peak near 2900 cm-1 corresponding to C-H stretching modes and peaks below 2000 cm-1 corresponding to C-C modes and C-H bending modes. Surface morphology of the films has been studied with AFM and the result shows the formation of uniform films. Optical contact angle (OCA) shows that DLC coated PMMA is more hydrophobic compared to uncoated surface.
Contribution
  • Himani Jain
Modification of PMMA with DLC using RF-PECVD
  • 2009
Contribution
  • Himani Jain
Deposition of Polycrystalline Alumina by Plasma Enhanced CVD from Metal-organic Precursors
  • 2009
Contribution
  • Himani Jain
Study of Al doped diamond like carbon films deposited by ICP-CVD using Metal Organic Precursors
  • 2009
JournalArticle
  • S. Mishra
  • Himani Jain
  • Rupa, P. K. P.
  • L. Pathak
Deposition of nanostructured Si–C–N superhard coatings by rf magnetron sputtering , vol24
  • 2006

DOI: 10.1116/1.2200377

Systematic investigation on the deposition of thin silicon-carbon-nitride films by reactive rf magnetron sputtering from SiC–C composite target in nitrogen-argon atmosphere was studied. The significant effect of deposition pressures on the hardness of the deposited SiCN films was found, which varied between 4.7 and 44GPa. The films were found to be amorphous from x-ray diffraction analysis but localized crystallization was noticed during atomic force microscopy (AFM) studies on these deposited films. The AFM studies also suggested that the increased hardness was due to reduction in particle size and localized formation of β-C3N4 and β-Si3N4 phase in the films. The x-ray photoelectron spectroscopy analyses showed the formation of C–N and Si–N bonds for the harder film. The increased nitrogen concentration in the sputtering gas mixture to 99% resulted in large particle growth and graphitic phase formation, which exhibited a low hardness value of 4.7GPa. The high C content and low Si content in the deposited films facilitated the graphitic phase formation.
JournalArticle
  • S. Mishra
  • Himani Jain
  • Rupa, P. K. P.
  • L. Pathak
Deposition of nanostructured Si–C–N superhard coatings by rf magnetron sputtering , vol24
  • 2006

DOI: 10.1116/1.2200377

Systematic investigation on the deposition of thin silicon-carbon-nitride films by reactive rf magnetron sputtering from SiC–C composite target in nitrogen-argon atmosphere was studied. The significant effect of deposition pressures on the hardness of the deposited SiCN films was found, which varied between 4.7 and 44GPa. The films were found to be amorphous from x-ray diffraction analysis but localized crystallization was noticed during atomic force microscopy (AFM) studies on these deposited films. The AFM studies also suggested that the increased hardness was due to reduction in particle size and localized formation of β-C3N4 and β-Si3N4 phase in the films. The x-ray photoelectron spectroscopy analyses showed the formation of C–N and Si–N bonds for the harder film. The increased nitrogen concentration in the sputtering gas mixture to 99% resulted in large particle growth and graphitic phase formation, which exhibited a low hardness value of 4.7GPa. The high C content and low Si content in the deposited films facilitated the graphitic phase formation.