Prof. Dr. Maria Kufner

Forschung und Entwicklung in den Bereichen

  • Sensorik
  • Mikrosystemtechnik
  • Mikrooptik
  • optische Messtechnik

Professorin

TCTS O 18

09923/80108-501


Sprechzeiten

nach Vereinbarung


Patent
  • Maria Kufner
  • F. Brand
  • V. Fairuschin
  • D. Schäffer
Distance sensor
  • 2018
The invention relates to a distance sensor (16, 18) of a motor vehicle, in particular for collision monitoring of an electromotive door adjustment (2), with a lighting device (28) for emitting light (36) having an emission angle range (50), and with a detection device (30) for receiving the emitted light (36) having a detection angle range (54). The distance sensor (16, 18) further comprises an optical element (32) for guiding the emitted light (36), the optical element (32) having a first input angular range (46) and a reduced second input angular range (48) between which a Number of optical fibers (44) is arranged. The invention further relates to an electromotive door adjustment (2) of a motor vehicle.
Contribution
  • F. Brand
  • D. Schäffer
  • W. Foß
  • Maria Kufner
Simulation zur Herstellung von planar integrierten Multimode-Wellenleitern in Glas , volurn:nbn:de:0287-2018-P037
  • 2018
Patent
  • Maria Kufner
  • F. Brand
  • V. Fairuschin
  • D. Schäffer
Abstandssensor
  • 2018
Patent
  • Maria Kufner
  • F. Brand
  • V. Fairuschin
  • D. Schäffer
Distance sensor
  • 2018
The invention relates to a distance sensor (16, 18) of a motor vehicle, in particular for collision monitoring of an electromotive door adjustment (2), with a lighting device (28) for emitting light (36) having an emission angle range (50), and with a detection device (30) for receiving the emitted light (36) having a detection angle range (54). The distance sensor (16, 18) further comprises an optical element (32) for guiding the emitted light (36), the optical element (32) having a first input angular range (46) and a reduced second input angular range (48) between which a Number of optical fibers (44) is arranged. The invention further relates to an electromotive door adjustment (2) of a motor vehicle.
Patent
  • Maria Kufner
  • F. Brand
  • V. Fairuschin
  • D. Schäffer
Abstandssensor
  • 2018
Contribution
  • D. Schäffer
  • F. Brand
  • W. Foß
  • Maria Kufner
Herstellung von planar integrierten Multimode-Wellenleitern in Glas für asymmetrische Verzweiger , volurn:nbn:de:0287-2018-A035
  • 2018
Optische Kommunikation über Multimode-Wellenleiter findet vermehrt Einsatz im Bereich der Datacom-Netze. Besonderes Interesse gilt unter anderem Verzweigern mit asymmetrischer Leistungsaufteilung zum Monitoring des Datenverkehrs. Eine vielversprechende Technologie, diese Komponenten mit den dafür erforderlichen Eigenschaften herzustellen, ist der Natrium-Silber-Ionenaustausch in Glas. Gängige Methoden für Design und Herstellung von Singlemode-Verzweigern sind auf Multimode-Verzweiger mit hoher Asymmetrie nicht unmittelbar übertragbar. Die Herstellung von planar integrierten Multimode-Lichtwellenleitern durch die Kombination von Fotolithographie und feldunterstütztem Ionenaustausch wird näher beleuchtet. Hier wird insbesondere zwischen Nass- und Trockendiffusionsprozessen unterschieden. Erste experimentelle Ergebnisse werden zusammen mit der zugehörigen Messmethodik zur Bestimmung der Brechzahlprofile vorgestellt. Diese zeigen neben der Ausprägung der Brechzahlunterschiede auch die Interaktion zwischen eng angeordnete Wellenleiter beim Herstellungsprozess auf.
Contribution
  • F. Brand
  • D. Schäffer
  • W. Foß
  • Maria Kufner
Simulation zur Herstellung von planar integrierten Multimode-Wellenleitern in Glas , volurn:nbn:de:0287-2018-P037
  • 2018
Contribution
  • D. Schäffer
  • F. Brand
  • W. Foß
  • Maria Kufner
Herstellung von planar integrierten Multimode-Wellenleitern in Glas für asymmetrische Verzweiger , volurn:nbn:de:0287-2018-A035
  • 2018
Optische Kommunikation über Multimode-Wellenleiter findet vermehrt Einsatz im Bereich der Datacom-Netze. Besonderes Interesse gilt unter anderem Verzweigern mit asymmetrischer Leistungsaufteilung zum Monitoring des Datenverkehrs. Eine vielversprechende Technologie, diese Komponenten mit den dafür erforderlichen Eigenschaften herzustellen, ist der Natrium-Silber-Ionenaustausch in Glas. Gängige Methoden für Design und Herstellung von Singlemode-Verzweigern sind auf Multimode-Verzweiger mit hoher Asymmetrie nicht unmittelbar übertragbar. Die Herstellung von planar integrierten Multimode-Lichtwellenleitern durch die Kombination von Fotolithographie und feldunterstütztem Ionenaustausch wird näher beleuchtet. Hier wird insbesondere zwischen Nass- und Trockendiffusionsprozessen unterschieden. Erste experimentelle Ergebnisse werden zusammen mit der zugehörigen Messmethodik zur Bestimmung der Brechzahlprofile vorgestellt. Diese zeigen neben der Ausprägung der Brechzahlunterschiede auch die Interaktion zwischen eng angeordnete Wellenleiter beim Herstellungsprozess auf.
JournalArticle
  • F. Singer
  • Maria Kufner
Model based laser-ultrasound determination of hardness gradients of gas-carburized steel , vol88
  • 2017

DOI: 10.1016/j.ndteint.2017.02.006

Gas carburizing is a common industrial process utilized for case hardening of low carbon steels. However, thereis a lack of non-destructive evaluation systems for the measurement of hardness-depth profiles. We propose anovel measurement method for the determination of hardness-depth profiles of two-step gas carburized steelspecimens. The method is based on the measurement of broadband laser excited Rayleigh waves. Rayleighwaves were generated by a pulsed Nd: YAG laser in the thermoelastic regime and measured with a heterodyneMach-Zehnder interferometer in the near-field. From two measurements with different source to receiverdistances the dispersion diagrams were calculated by means of the phase spectral analysis method. In order tosimulate the observed dispersive behavior of the Rayleigh waves,first the two-step gas carburizing process wassimulated using solutions of the diffusion equation. The resulting continuous hardness profile was thendiscretized into up to 100 layers. Thereafter the Rayleigh wave dispersion diagram was calculated from thediscretized stack of layers using a delta-matrix formulation of the Thomson-Haskell transfer matrix method. Inorder to obtain bestfitting hardness profiles, the simulated dispersion diagrams werefitted to measurementswith a curvefitting algorithm. Comparison of the Rayleigh wave inversion method with destructively obtainedVickers hardness profiles shows good quantitative agreement.
JournalArticle
  • F. Singer
  • Maria Kufner
Model based laser-ultrasound determination of hardness gradients of gas-carburized steel , vol88
  • 2017

DOI: 10.1016/j.ndteint.2017.02.006

Gas carburizing is a common industrial process utilized for case hardening of low carbon steels. However, thereis a lack of non-destructive evaluation systems for the measurement of hardness-depth profiles. We propose anovel measurement method for the determination of hardness-depth profiles of two-step gas carburized steelspecimens. The method is based on the measurement of broadband laser excited Rayleigh waves. Rayleighwaves were generated by a pulsed Nd: YAG laser in the thermoelastic regime and measured with a heterodyneMach-Zehnder interferometer in the near-field. From two measurements with different source to receiverdistances the dispersion diagrams were calculated by means of the phase spectral analysis method. In order tosimulate the observed dispersive behavior of the Rayleigh waves,first the two-step gas carburizing process wassimulated using solutions of the diffusion equation. The resulting continuous hardness profile was thendiscretized into up to 100 layers. Thereafter the Rayleigh wave dispersion diagram was calculated from thediscretized stack of layers using a delta-matrix formulation of the Thomson-Haskell transfer matrix method. Inorder to obtain bestfitting hardness profiles, the simulated dispersion diagrams werefitted to measurementswith a curvefitting algorithm. Comparison of the Rayleigh wave inversion method with destructively obtainedVickers hardness profiles shows good quantitative agreement.
Contribution
  • F. Brand
  • F. Singer
  • M. Gerbeth
  • Maria Kufner
Vergleich zwischen Laser-Doppler- und photorefraktivem Interferometer zur Messung von akustischen Oberflächenwellen unter industriellen Bedingungen , vol18
  • 2016

DOI: 10.5162/sensoren2016/6.1.3

Laserbasierte-Ultraschall Verfahren werden unter Laborbedingungen bereits häufig verwendet, um Werkstoffeigenschaften zu ermitteln. Falls die zu vermessenden Proben jedoch eine diffuse Reflexion des Messlaserstrahls verursachen, treten häufig Probleme bei der Anwendbarkeit der laserbasierten Detektion auf. Ein zusätzliches Problem für die Anwendbarkeit von laserbasierten Ultraschall-Verfahren im industriellen Umfeld stellen niederfrequente Umgebungsschwingungen dar. Ein Interferometer mit photorefraktivem Kristall verspricht selbst bei einer Reflexion mit Speckle-Muster und Störschwingungen noch gute Signal-zu-Rausch-Verhältnisse. Ein Laser-Doppler-Vibrometer besitzt dagegen unter Laborbedingungen theoretisch eine niedrigere Detektionsgrenze, sofern eine gut reflektierende Probe sowie ausreichende Isolation von Störschwingungen vorhanden sind. Im Rahmen dieser Arbeit wird ein selbst entwickeltes Interferometer mit photorefraktivem Kristall mit einem Laser-Doppler-Vibrometer verglichen. Als Probe dient eine geschliffene Stahlprobe, die für die optische Messung nicht speziell behandelt wurde.
JournalArticle
  • K. Drese
  • Maria Kufner
  • G. Lindner
Messen mit seismischem Spürsinn
  • 2016
Patent
  • S. Kufner
  • Maria Kufner
  • A. Radev
  • B. Roß
  • W. Foß
Sensor unit
  • 2016
Patent
  • S. Kufner
  • Maria Kufner
  • A. Radev
  • B. Roß
  • W. Foß
Sensor unit
  • 2016
JournalArticle
  • K. Drese
  • Maria Kufner
  • G. Lindner
Messen mit seismischem Spürsinn
  • 2016
Contribution
  • F. Brand
  • F. Singer
  • M. Gerbeth
  • Maria Kufner
Vergleich zwischen Laser-Doppler- und photorefraktivem Interferometer zur Messung von akustischen Oberflächenwellen unter industriellen Bedingungen , vol18
  • 2016

DOI: 10.5162/sensoren2016/6.1.3

Laserbasierte-Ultraschall Verfahren werden unter Laborbedingungen bereits häufig verwendet, um Werkstoffeigenschaften zu ermitteln. Falls die zu vermessenden Proben jedoch eine diffuse Reflexion des Messlaserstrahls verursachen, treten häufig Probleme bei der Anwendbarkeit der laserbasierten Detektion auf. Ein zusätzliches Problem für die Anwendbarkeit von laserbasierten Ultraschall-Verfahren im industriellen Umfeld stellen niederfrequente Umgebungsschwingungen dar. Ein Interferometer mit photorefraktivem Kristall verspricht selbst bei einer Reflexion mit Speckle-Muster und Störschwingungen noch gute Signal-zu-Rausch-Verhältnisse. Ein Laser-Doppler-Vibrometer besitzt dagegen unter Laborbedingungen theoretisch eine niedrigere Detektionsgrenze, sofern eine gut reflektierende Probe sowie ausreichende Isolation von Störschwingungen vorhanden sind. Im Rahmen dieser Arbeit wird ein selbst entwickeltes Interferometer mit photorefraktivem Kristall mit einem Laser-Doppler-Vibrometer verglichen. Als Probe dient eine geschliffene Stahlprobe, die für die optische Messung nicht speziell behandelt wurde.
JournalArticle
  • J. Landskron
  • K. Schmidt
  • Maria Kufner
  • G. Lindner
Stable vortex generation in liquid filled wells by mode conversion of surface acoustic waves , vol70
  • 2015

DOI: 10.1016/j.phpro.2015.08.051

The formation of stable vortex flow pattern has been observed at liquid filled aluminum wells of 15 to 30 mm diameter when Lamb waves are excited on the bottom of the wells by piezoelectric transducers operated at a frequency of 1 MHz. The shape of the vortex pattern changed with the position of the transducer. Strong differences in mixing times were observed between water and ethanol when the filling level was changed and a remarkable reduction of mixing time was achieved by the addition of a small amount of detergent to water at small filling levels. Besides mixing of liquids thermal equilibration within a liquid volume was accelerated by acoustic streaming.
JournalArticle
  • J. Landskron
  • K. Schmidt
  • Maria Kufner
  • G. Lindner
Stable vortex generation in liquid filled wells by mode conversion of surface acoustic waves , vol70
  • 2015

DOI: 10.1016/j.phpro.2015.08.051

The formation of stable vortex flow pattern has been observed at liquid filled aluminum wells of 15 to 30 mm diameter when Lamb waves are excited on the bottom of the wells by piezoelectric transducers operated at a frequency of 1 MHz. The shape of the vortex pattern changed with the position of the transducer. Strong differences in mixing times were observed between water and ethanol when the filling level was changed and a remarkable reduction of mixing time was achieved by the addition of a small amount of detergent to water at small filling levels. Besides mixing of liquids thermal equilibration within a liquid volume was accelerated by acoustic streaming.
Patent
Patent
Patent
Patent
Patent
  • L. Ross
  • S. Kufner
  • Maria Kufner
  • W. Foß
  • M. Bock
  • F. Baetz
Method for producing an optical splitter cascade and optical assembly
  • 2012
An optical assembly, which is in particular in the form of a splitter component with a so-called splitter forming a passive optical component, is produced particularly inexpensively. In a first step a plurality of splitters are produced on a common wafer by forming a corresponding conductor track pattern. In a second step optical fibers are coupled simultaneously to the connection sides of the individual splitters with the aid of a connection carrier. Then, in a third step the individual splitters with the connection carriers connected thereto are separated form one another. Only one common coupling operation for a large number of splitters is required. The splitters may then be connected to form a splitter cascade.
Patent
  • L. Ross
  • S. Kufner
  • Maria Kufner
  • W. Foß
  • M. Bock
  • F. Baetz
Method for producing an optical splitter cascade and optical assembly
  • 2012
An optical assembly, which is in particular in the form of a splitter component with a so-called splitter forming a passive optical component, is produced particularly inexpensively. In a first step a plurality of splitters are produced on a common wafer by forming a corresponding conductor track pattern. In a second step optical fibers are coupled simultaneously to the connection sides of the individual splitters with the aid of a connection carrier. Then, in a third step the individual splitters with the connection carriers connected thereto are separated form one another. Only one common coupling operation for a large number of splitters is required. The splitters may then be connected to form a splitter cascade.
Patent
  • H.-J. Guttmann
  • Maria Kufner
  • S. Kufner
  • L. Ross
  • A. Weinert
Passive optical component for use as combiner in optical plug connection system for connection of light wave spacer in high speed fiber lasers, has support substrate halves connected with guide halves such the guide halves form wave guides
  • 2011
The optical component (2), in particular a passive component (2) with an optical waveguide pattern (18) integrated in a carrier substrate (4), is designed in particular as a combiner for a high-power fiber laser. The device (2) has two preferably identical planar carrier substrate halves (4A, 4B) with integrated waveguide halves (6A, 6B) formed by field-enhanced ion diffusion. The two carrier substrate halves (4A, 4B) are bonded together without the use of a polymeric adhesive such that the respective waveguide halves (6A, 6B) form a waveguide (6). As a result, a higher design possibility in the formation of the waveguide pattern (18) is possible in comparison to conventional fusible couplers and it can be coupled to a variety of common types of optical fiber, including those that can not be used in fused couplers.
Patent
  • H.-J. Guttmann
  • Maria Kufner
  • S. Kufner
  • L. Ross
  • A. Weinert
Passive optical component for use as combiner in optical plug connection system for connection of light wave spacer in high speed fiber lasers, has support substrate halves connected with guide halves such the guide halves form wave guides
  • 2011
The optical component (2), in particular a passive component (2) with an optical waveguide pattern (18) integrated in a carrier substrate (4), is designed in particular as a combiner for a high-power fiber laser. The device (2) has two preferably identical planar carrier substrate halves (4A, 4B) with integrated waveguide halves (6A, 6B) formed by field-enhanced ion diffusion. The two carrier substrate halves (4A, 4B) are bonded together without the use of a polymeric adhesive such that the respective waveguide halves (6A, 6B) form a waveguide (6). As a result, a higher design possibility in the formation of the waveguide pattern (18) is possible in comparison to conventional fusible couplers and it can be coupled to a variety of common types of optical fiber, including those that can not be used in fused couplers.
JournalArticle
  • Maria Kufner
  • S. Kufner
Ion exchange technology for optical waveguides
  • 2011

DOI: 10.1002/opph.201190385

The term ‘integrated optics’ has been created more than 30 years ago and describes a family of technologies where light guiding structures are inte-grated on planar substrates. The concept corresponds to electronic integration, where lithographical tools are used to create structures in the micron range with submicron precision. One of the first reliable production processes for in-tegrated optical waveguides was ion ex-change in glass.
JournalArticle
  • Maria Kufner
  • S. Kufner
Ion exchange technology for optical waveguides
  • 2011

DOI: 10.1002/opph.201190385

The term ‘integrated optics’ has been created more than 30 years ago and describes a family of technologies where light guiding structures are inte-grated on planar substrates. The concept corresponds to electronic integration, where lithographical tools are used to create structures in the micron range with submicron precision. One of the first reliable production processes for in-tegrated optical waveguides was ion ex-change in glass.
Patent
Patent
JournalArticle
  • S. Voigt
  • S. Kufner
  • Maria Kufner
  • I. Frese
A refractive free space micro-optical 4x4 interconnect on chip-level with optical fan-out fabricated by the LIGA-technique
  • 2002
JournalArticle
  • S. Voigt
  • S. Kufner
  • Maria Kufner
  • I. Frese
A refractive free space micro-optical 4x4 interconnect on chip-level with optical fan-out fabricated by the LIGA-technique
  • 2002
Contribution
  • Maria Kufner
  • S. Kufner
  • S. Voigt
A refractive free space micro-optical 4x4 interconnect with aspherical lenses and fan-out
  • 2002
Contribution
  • Maria Kufner
  • S. Kufner
  • S. Voigt
A refractive free space micro-optical 4x4 interconnect with aspherical lenses and fan-out
  • 2002
JournalArticle
  • L. Singleton
  • Maria Kufner
  • S. Megtert
Considerations for the Deep X-ray Lithography with the SU-8 Resist , vol14
  • 2001

DOI: 10.2494/photopolymer.14.649

It is shown, that deep X-ray exposures of the SU-8 resist can achieve high resolution with substantially reduced exposure times. Irradiation at the synchrotron source of DCI at Lure (Paris) demonstrated a reduced exposure time for a 600μm thick SU-8, where the dose needed to obtain standing structures was 30J/cm3. Critical dimension measurements (CD) of the 600μm SU-8 resist structure have been obtained for the entire height of the structure and X-ray doses of 30J/cm3 achieved a CD gain per edge of +0.5μm, while doses of 40J/cm3 yielded a CD gain per edge of 0.9μm. However, the gain in the CD per edge is critically dependent on the solvent content in the resist. Doses of 40J/cm3 into a resist with a 2-4% residual solvent content yielded CD gains per edge of 0.3μm. Moreover, the variation in the CD per edge is less than 0.1μm along the entire height of the structure.
JournalArticle
  • S. Kufner
  • I. Frese
  • Maria Kufner
Optisches Backplane-Konzept auf der Basis von Wellenleiteroptik kombiniert mit Freiraumoptik , vol91
  • 2001
JournalArticle
  • I. Frese
  • S. Kufner
  • Maria Kufner
Novel optical backplane for automotive applications
  • 2001
Book
JournalArticle
  • I. Frese
  • S. Kufner
  • Maria Kufner
Novel optical backplane for automotive applications
  • 2001
Book
JournalArticle
  • L. Singleton
  • Maria Kufner
  • S. Megtert
Considerations for the Deep X-ray Lithography with the SU-8 Resist , vol14
  • 2001

DOI: 10.2494/photopolymer.14.649

It is shown, that deep X-ray exposures of the SU-8 resist can achieve high resolution with substantially reduced exposure times. Irradiation at the synchrotron source of DCI at Lure (Paris) demonstrated a reduced exposure time for a 600μm thick SU-8, where the dose needed to obtain standing structures was 30J/cm3. Critical dimension measurements (CD) of the 600μm SU-8 resist structure have been obtained for the entire height of the structure and X-ray doses of 30J/cm3 achieved a CD gain per edge of +0.5μm, while doses of 40J/cm3 yielded a CD gain per edge of 0.9μm. However, the gain in the CD per edge is critically dependent on the solvent content in the resist. Doses of 40J/cm3 into a resist with a 2-4% residual solvent content yielded CD gains per edge of 0.3μm. Moreover, the variation in the CD per edge is less than 0.1μm along the entire height of the structure.
JournalArticle
  • S. Kufner
  • I. Frese
  • Maria Kufner
Optisches Backplane-Konzept auf der Basis von Wellenleiteroptik kombiniert mit Freiraumoptik , vol91
  • 2001
Contribution
  • S. Kufner
  • Maria Kufner
  • I. Frese
  • W. Ehrfeld
Novel Optical Backplane for Automotive Applications
  • 2000
Deep etch lithography like the LIGA technique combines high precision and mass production capability. It is a well suited candidate for precIsion micro-optics because of its unique characteristic which allows the fabrication of optical and mechanical micro-elements in the same substrate. In this paper we will focus on a novel alignment tolerant optical backplane approach well suited for automotive applications that is based on a hybrid integration of guided wave and freespace micro-optics by the LIGA technique.
Contribution
  • S. Kufner
  • Maria Kufner
  • I. Frese
  • T. Paatzsch
  • H.-D. Bauer
  • W. Ehrfeld
Micro-Optics for Optical Interconnects in Automotive Applications
  • 2000
Contribution
  • S. Kufner
  • Maria Kufner
  • I. Frese
  • T. Paatzsch
  • H.-D. Bauer
  • W. Ehrfeld
Micro-Optics for Optical Interconnects in Automotive Applications
  • 2000
Contribution
  • I. Frese
  • S. Kufner
  • Maria Kufner
  • T. Paatzsch
  • H.-D. Bauer
  • W. Ehrfeld
Combination of guided wave and free space micro-optics for a new optical backplane concept
  • 2000
Contribution
  • I. Frese
  • S. Kufner
  • Maria Kufner
  • T. Paatzsch
  • H.-D. Bauer
  • W. Ehrfeld
Combination of guided wave and free space micro-optics for a new optical backplane concept
  • 2000
Contribution
  • S. Kufner
  • Maria Kufner
  • I. Frese
  • W. Ehrfeld
Novel Optical Backplane for Automotive Applications
  • 2000
Deep etch lithography like the LIGA technique combines high precision and mass production capability. It is a well suited candidate for precIsion micro-optics because of its unique characteristic which allows the fabrication of optical and mechanical micro-elements in the same substrate. In this paper we will focus on a novel alignment tolerant optical backplane approach well suited for automotive applications that is based on a hybrid integration of guided wave and freespace micro-optics by the LIGA technique.
JournalArticle
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • I. Veretennicoff
  • R. Bockstaele
  • A. Van Hove
  • B. Dhoedt
  • R. Baets
  • H. Thienpont
Performances of optical multi-chip-module interconnects: comparing guided-Wave and free-space pathways , vol1
  • 1999

DOI: 10.1088/1464-4258/1/2/027

We simulate and compare optical transmission efficiencies, throughputs and interconnection lengths of free-space and POF-based guided-wave multi-chip-module optical interconnection demonstrators for different types of microcavity emitters.
Contribution
  • J. Schulze
  • W. Ehrfeld
  • J. Hoßfeld
  • M. Klaus
  • Maria Kufner
  • S. Kufner
  • H. Müller
  • A. Picard
Parallel optical interconnetion using self adjusting microlenses on injection moulded ferrules made by LIGA technique
  • 1999
Contribution
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Deep Proton Lithographic CAD-CAM for the fabrication of Monolithic Micro-optical Elements
  • 1999
The technology of deep proton lithography in PMMA (poly methyl methacrylate) is a fabrication method for monolithic integrated refractive micro-optical elements and micro-mechanical holder structures, which allows structural depths in the order of several hundred microns. Different optical functions can be fabricated in one block and form monolithic integrated optical systems. In addition mechanical support structures and alignment features can be integrated with these optical systems. This paper will focus on the technological requirements of the irradiation, the development and diffusion procedures, and of the computer aided design-computer aided manufacturing (CAD-CAM) approach, which are necessary to achieve reproducible micro-optical components.
Contribution
  • J. Schulze
  • W. Ehrfeld
  • J. Hoßfeld
  • M. Klaus
  • Maria Kufner
  • S. Kufner
  • H. Müller
  • A. Picard
Parallel optical interconnetion using self adjusting microlenses on injection moulded ferrules made by LIGA technique
  • 1999
Contribution
  • Maria Kufner
  • S. Kufner
Refraktive Mikrooptik für optische Intrachip Verbindungen
  • 1999
Contribution
  • Maria Kufner
  • S. Kufner
Refraktive Mikrooptik für optische Intrachip Verbindungen
  • 1999
Contribution
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Deep Proton Lithographic CAD-CAM for the fabrication of Monolithic Micro-optical Elements
  • 1999
The technology of deep proton lithography in PMMA (poly methyl methacrylate) is a fabrication method for monolithic integrated refractive micro-optical elements and micro-mechanical holder structures, which allows structural depths in the order of several hundred microns. Different optical functions can be fabricated in one block and form monolithic integrated optical systems. In addition mechanical support structures and alignment features can be integrated with these optical systems. This paper will focus on the technological requirements of the irradiation, the development and diffusion procedures, and of the computer aided design-computer aided manufacturing (CAD-CAM) approach, which are necessary to achieve reproducible micro-optical components.
JournalArticle
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • I. Veretennicoff
  • R. Bockstaele
  • A. Van Hove
  • B. Dhoedt
  • R. Baets
  • H. Thienpont
Performances of optical multi-chip-module interconnects: comparing guided-Wave and free-space pathways , vol1
  • 1999

DOI: 10.1088/1464-4258/1/2/027

We simulate and compare optical transmission efficiencies, throughputs and interconnection lengths of free-space and POF-based guided-wave multi-chip-module optical interconnection demonstrators for different types of microcavity emitters.
JournalArticle
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • I. Veretennicoff
  • R. Bockstaele
  • A. Van Hove
  • B. Dhoedt
  • R. Baets
  • H. Thienpont
Performance simulations of multi-chip-module interconnects: Comparing guided-wave and free-space pathways , vol1
  • 1999
Contribution
  • H. Ottevaere
  • V. Baukens
  • P. Vynck
  • P. Tuteleers
  • B. Volckaerts
  • G. Verschaffelt
  • C. Debaes
  • K. Helderweirt
  • B. Vercouter
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Refractive Microlens Arrays made by Deep Proton Lithgraphy: technology and characterisation
  • 1999
JournalArticle
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • I. Veretennicoff
  • R. Bockstaele
  • A. Van Hove
  • B. Dhoedt
  • R. Baets
  • H. Thienpont
Performance simulations of multi-chip-module interconnects: Comparing guided-wave and free-space pathways , vol1
  • 1999
Contribution
  • H. Ottevaere
  • V. Baukens
  • P. Vynck
  • P. Tuteleers
  • B. Volckaerts
  • G. Verschaffelt
  • C. Debaes
  • K. Helderweirt
  • B. Vercouter
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Refractive Microlens Arrays made by Deep Proton Lithgraphy: technology and characterisation
  • 1999
Contribution
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Photonics in Computing Applications
  • 1998
Contribution
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Photonics in Computing Applications
  • 1998
JournalArticle
  • G. Verschaffelt
  • R. Buczynski
  • P. Tutleers
  • P. Vynck
  • V. Baukens
  • H. Ottevaere
  • C. Debaes
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • S. Borghs
  • I. Veretennicoff
  • H. Thienpont
Demonstration of a Monolithic Multichannel Module for Multi-Gb/s Intra- MCM Optical Interconnects , vol10
  • 1998

DOI: 10.1109/68.726772

In this letter, we report on the demonstration of a 2.48-Gb/s multichannel optical data-link for intramultichip module interconnects. The optical module was fabricated in polymethylmethacrylate (PMMA) by deep proton lithography and monolithically integrates micromirrors and cylindrical lenses. With the same technology, we have also fabricated a single-channel optical bridge and used this component to demonstrate a proof-of-principle optical intrachip interconnect by establishing a digital data-link between optoelectronic transceivers integrated on the same chip.
Contribution
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • H. Ottevaere
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • P. Heremans
  • H. Thienpont
  • I. Veretennicoff
Fabrication and experimental demonstration of a multi-channel module for intra-MCM optical interconnects
  • 1998

DOI: 10.1109/CLEO.1998.676285

Summary form only given. We use deep proton irradiation of poly(methyl methacrylate) (PMMA) as a deep-etch lithographic technique that allows us to fabricate monolithic structures integrating refractive microlenses, micromirrors, fiber positioning holes, standoffs, and alignment features. The technique works as follows: a proton beam in the energy range between 5 and 10 MeV, passing through a metal mask, impinges on a high-molecular-weight PMMA substrate.
Contribution
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • H. Ottevaere
  • C. Debaes
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • S. Borghs
  • I. Veretennicoff
  • H. Thienpont
Experimental demonstration of a multi-channel micro-optical bridge for multi-Gb/s, free-space intra MCM interconnects
  • 1998
We demonstrate a 2.5Gb/s optical intra-MCM data link with a four-channel micro-optical bridge. Thisbridge was fabricated by deep proton lithography and monolithically integrates cylindrical lenses and micro-mirrors.
Contribution
  • H. Thienpont
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • P. Heremans
  • I. Veretennicoff
Demonstration of a Monolithic Micro-Optical Bridge for Free-Space Intrachip Interconnects
  • 1998
Future advances in the application of photonic interconnects will involve the insertion of parallel-channel linksinto Multi-Chip Modules (MCMs) [1]. These will make use of new device-level components such as arrays of Vertical Cavity Surface Emitting Lasers (VCSEL's) [2] or arrays of Micro Cavity Light-Emitting Diodes(MCLED’s) [3] and low power photoreceiver circuits [4]. One of the challenges associated with the development of free-space intra- and inter-MCM optoelectronic interconnects is the fabrication of manufacturable, chip-compatible,and high precision monolithic micro-optical pathway blocks. These three-dimensional modules should integratemicro-optical components to optically interconnect surface-normal transmitters and receivers.In this paper we first report on the fabrication of such a refractive micro-optical bridge by deep protonlithography [5]. Next we use this component to demonstrate the proof-of-principle of optical intra-chipinterconnects by establishing a digital data link between optoelectronic transceivers positioned on the same chip.Finally we project future performances of this approach by extrapolating present-day results in the light of improved lens and emitter characteristics.Deep proton irradiation of Poly Methyl MethAcrylate (PMMA) is a deep etch lithographic technique that allowsthe fabrication of monolithic structures integrating refractive microlenses, microprisms, fiber positioning holes,stand-offs and alignment features [5] [6]. The technique works as follows: a proton beam in the energy rangebetween 5 and 10 MeV, passing through a metal mask, impinges on a high molecular weight PMMA substrate. Theprotons break the polymer chains and decrease the material's molecular weight. Using a specific developer theirradiated zone can then be selectively removed, making it possible to structure the sample to depths of severalhundreds of microns with an optical surface quality of better than 20 nm. To demonstrate an intra-chip opticalinterconnect between two opto-electronic transceiver elements, we have applied this deep proton lithography tofabricate a monolithic micro-optical bridge consisting of two micromirrors and two cylindrical microlenses (seeFig. 1 and Fig. 2).As opto-electronic transceiver elements we have used optical thyristors [7]. These emitter-receiver devices arefabricated as a double heterojunction PnpN structure in the GaAs/AlGaAs material system. They are bistableFigure 1 Setup for intra-chip datatranscriptionFigure 2 Photograph of the micro-optical bridge used torealize the optical pathway represented in fig. 1
Contribution
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • I. Veretennicoff
  • R. Bockstaele
  • B. Dhoedt
  • R. Baets
  • H. Thienpont
Performance simulations of optical multi-chip-module interconnects: Comparing guided-wave and free-space pathways
  • 1998
Contribution
  • H. Ottevaere
  • V. Baukens
  • P. Vynck
  • P. Tuteleers
  • K. Helderweirt
  • B. Vercouter
  • B. Volckaerts
  • G. Verschaffelt
  • C. Debaes
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Arrays of Spherical Microlenses Fabricated with Deep Proton Lithography
  • 1998
Contribution
  • F. Berghmans
  • M. Decreton
  • H. Thienpont
  • T. Nasilowski
  • K. Zdrodowski
  • K. Radomski
  • A. Bekiesza
  • Y. Carnicer
  • S. Kufner
  • Maria Kufner
  • I. Veretennicoff
Demonstration of a compact polarisation based two-dimensional multimode optical fibre space switch as optical fibre sensor multiplexer
  • 1998

DOI: 10.1109/CLEOE.1998.719329

Contribution
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • H. Ottevaere
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • P. Heremans
  • H. Thienpont
  • I. Veretennicoff
Fabrication and experimental demonstration of a multi-channel module for intra-MCM optical interconnects
  • 1998

DOI: 10.1109/CLEO.1998.676285

Summary form only given. We use deep proton irradiation of poly(methyl methacrylate) (PMMA) as a deep-etch lithographic technique that allows us to fabricate monolithic structures integrating refractive microlenses, micromirrors, fiber positioning holes, standoffs, and alignment features. The technique works as follows: a proton beam in the energy range between 5 and 10 MeV, passing through a metal mask, impinges on a high-molecular-weight PMMA substrate.
JournalArticle
  • F. Berghmans
  • T. Nasilowski
  • K. Zdrodowski
  • K. Radomski
  • A. Bekiesza
  • Y. Carnicer
  • S. Kufner
  • Maria Kufner
  • M. Decreton
  • I. Veretennicoff
  • H. Thienpont
A Cascadable Polarization-Based 1 to 9 Multimode Optical Fiber Switch using a PMMA Fiber Array Holder , vol16
  • 1998

DOI: 10.1109/50.704612

We have constructed an optical fiber switch, which allows to route an information carrying laser beam to nine multimode optical fibers. The fibers are accurately positioned in a polymethylmethacrylate (PMMA) fiber array holder, fabricated with deep proton lithography. To switch light from one fiber to another, we use active control of the polarization of light by means of nematic liquid crystal retarders or ferroelectric polarization rotators. The system shows insertion losses as low as 3 dB and crosstalk ratios below -30 dB. These figures are still susceptible to considerable improvements. The switching speed is on the order of 10 Hz using nematic liquid crystals and was extended to 10 kHz with ferroelectric liquid crystals. Potential applications of the fiber switch are discussed. As an illustration we have demonstrated the multiplexing of optical fiber proximity sensors. We also describe scale reduction and cascadability issues.
Contribution
  • H. Ottevaere
  • V. Baukens
  • P. Vynck
  • P. Tuteleers
  • K. Helderweirt
  • B. Vercouter
  • B. Volckaerts
  • G. Verschaffelt
  • C. Debaes
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Arrays of Spherical Microlenses Fabricated with Deep Proton Lithography
  • 1998
Contribution
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • H. Ottevaere
  • C. Debaes
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • S. Borghs
  • I. Veretennicoff
  • H. Thienpont
Experimental demonstration of a multi-channel micro-optical bridge for multi-Gb/s, free-space intra MCM interconnects
  • 1998
We demonstrate a 2.5Gb/s optical intra-MCM data link with a four-channel micro-optical bridge. Thisbridge was fabricated by deep proton lithography and monolithically integrates cylindrical lenses and micro-mirrors.
Contribution
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • I. Veretennicoff
  • R. Bockstaele
  • B. Dhoedt
  • R. Baets
  • H. Thienpont
Performance simulations of optical multi-chip-module interconnects: Comparing guided-wave and free-space pathways
  • 1998
JournalArticle
  • Maria Kufner
  • S. Kufner
Micro-optics for optical interconnects , vol12
  • 1998
Contribution
  • H. Ottevaere
  • P. Vynck
  • P. Tuteleers
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • H. Hermanne
  • H. Thienpont
  • I. Veretennicoff
Spherical Microlenses Fabricated with Deep Proton Lithography
  • 1998
JournalArticle
  • G. Verschaffelt
  • R. Buczynski
  • P. Tutleers
  • P. Vynck
  • V. Baukens
  • H. Ottevaere
  • C. Debaes
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • S. Borghs
  • I. Veretennicoff
  • H. Thienpont
Demonstration of a Monolithic Multichannel Module for Multi-Gb/s Intra- MCM Optical Interconnects , vol10
  • 1998

DOI: 10.1109/68.726772

In this letter, we report on the demonstration of a 2.48-Gb/s multichannel optical data-link for intramultichip module interconnects. The optical module was fabricated in polymethylmethacrylate (PMMA) by deep proton lithography and monolithically integrates micromirrors and cylindrical lenses. With the same technology, we have also fabricated a single-channel optical bridge and used this component to demonstrate a proof-of-principle optical intrachip interconnect by establishing a digital data-link between optoelectronic transceivers integrated on the same chip.
Contribution
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • H. Thienpont
  • I. Veretennicoff
  • R. Bockstaele
  • B. Dhoedt
  • R. Baets
Guided-wave versus free-space pathways for optical intra-multi-chip-module interconnects: Performance simulations and design rules
  • 1998
JournalArticle
  • Maria Kufner
  • S. Kufner
Micro-optics for optical interconnects , vol12
  • 1998
Contribution
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Advanced Fabrication Method for Monolithic Micro-optical Elements using Deep Proton Lithography and CAD-CAM
  • 1998
Contribution
  • H. Ottevaere
  • P. Vynck
  • P. Tuteleers
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • H. Hermanne
  • H. Thienpont
  • I. Veretennicoff
Spherical Microlenses Fabricated with Deep Proton Lithography
  • 1998
Contribution
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • H. Thienpont
  • I. Veretennicoff
  • R. Bockstaele
  • B. Dhoedt
  • R. Baets
Guided-wave versus free-space pathways for optical intra-multi-chip-module interconnects: Performance simulations and design rules
  • 1998
Contribution
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Advanced Fabrication Method for Monolithic Micro-optical Elements using Deep Proton Lithography and CAD-CAM
  • 1998
Contribution
  • G. Verschaffelt
  • C. Debaes
  • H. Ottevaere
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Demonstration of a 16-channel micro-optical interconnection module for free-space intra-MCM data communication
  • 1998
JournalArticle
  • F. Berghmans
  • T. Nasilowski
  • K. Zdrodowski
  • K. Radomski
  • A. Bekiesza
  • Y. Carnicer
  • S. Kufner
  • Maria Kufner
  • M. Decreton
  • I. Veretennicoff
  • H. Thienpont
A Cascadable Polarization-Based 1 to 9 Multimode Optical Fiber Switch using a PMMA Fiber Array Holder , vol16
  • 1998

DOI: 10.1109/50.704612

We have constructed an optical fiber switch, which allows to route an information carrying laser beam to nine multimode optical fibers. The fibers are accurately positioned in a polymethylmethacrylate (PMMA) fiber array holder, fabricated with deep proton lithography. To switch light from one fiber to another, we use active control of the polarization of light by means of nematic liquid crystal retarders or ferroelectric polarization rotators. The system shows insertion losses as low as 3 dB and crosstalk ratios below -30 dB. These figures are still susceptible to considerable improvements. The switching speed is on the order of 10 Hz using nematic liquid crystals and was extended to 10 kHz with ferroelectric liquid crystals. Potential applications of the fiber switch are discussed. As an illustration we have demonstrated the multiplexing of optical fiber proximity sensors. We also describe scale reduction and cascadability issues.
Contribution
  • G. Verschaffelt
  • C. Debaes
  • H. Ottevaere
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
  • H. Thienpont
Demonstration of a 16-channel micro-optical interconnection module for free-space intra-MCM data communication
  • 1998
Contribution
  • F. Berghmans
  • M. Decreton
  • H. Thienpont
  • T. Nasilowski
  • K. Zdrodowski
  • K. Radomski
  • A. Bekiesza
  • Y. Carnicer
  • S. Kufner
  • Maria Kufner
  • I. Veretennicoff
Demonstration of a compact polarisation based two-dimensional multimode optical fibre space switch as optical fibre sensor multiplexer
  • 1998

DOI: 10.1109/CLEOE.1998.719329

Contribution
  • H. Thienpont
  • P. Vynck
  • P. Tuteleers
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Optical Interconnects
  • 1998
Contribution
  • H. Thienpont
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • P. Heremans
  • I. Veretennicoff
Demonstration of a Monolithic Micro-Optical Bridge for Free-Space Intrachip Interconnects
  • 1998
Future advances in the application of photonic interconnects will involve the insertion of parallel-channel linksinto Multi-Chip Modules (MCMs) [1]. These will make use of new device-level components such as arrays of Vertical Cavity Surface Emitting Lasers (VCSEL's) [2] or arrays of Micro Cavity Light-Emitting Diodes(MCLED’s) [3] and low power photoreceiver circuits [4]. One of the challenges associated with the development of free-space intra- and inter-MCM optoelectronic interconnects is the fabrication of manufacturable, chip-compatible,and high precision monolithic micro-optical pathway blocks. These three-dimensional modules should integratemicro-optical components to optically interconnect surface-normal transmitters and receivers.In this paper we first report on the fabrication of such a refractive micro-optical bridge by deep protonlithography [5]. Next we use this component to demonstrate the proof-of-principle of optical intra-chipinterconnects by establishing a digital data link between optoelectronic transceivers positioned on the same chip.Finally we project future performances of this approach by extrapolating present-day results in the light of improved lens and emitter characteristics.Deep proton irradiation of Poly Methyl MethAcrylate (PMMA) is a deep etch lithographic technique that allowsthe fabrication of monolithic structures integrating refractive microlenses, microprisms, fiber positioning holes,stand-offs and alignment features [5] [6]. The technique works as follows: a proton beam in the energy rangebetween 5 and 10 MeV, passing through a metal mask, impinges on a high molecular weight PMMA substrate. Theprotons break the polymer chains and decrease the material's molecular weight. Using a specific developer theirradiated zone can then be selectively removed, making it possible to structure the sample to depths of severalhundreds of microns with an optical surface quality of better than 20 nm. To demonstrate an intra-chip opticalinterconnect between two opto-electronic transceiver elements, we have applied this deep proton lithography tofabricate a monolithic micro-optical bridge consisting of two micromirrors and two cylindrical microlenses (seeFig. 1 and Fig. 2).As opto-electronic transceiver elements we have used optical thyristors [7]. These emitter-receiver devices arefabricated as a double heterojunction PnpN structure in the GaAs/AlGaAs material system. They are bistableFigure 1 Setup for intra-chip datatranscriptionFigure 2 Photograph of the micro-optical bridge used torealize the optical pathway represented in fig. 1
Contribution
  • H. Thienpont
  • P. Vynck
  • P. Tuteleers
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • I. Veretennicoff
Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Optical Interconnects
  • 1998
Contribution
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • Maria Kufner
  • S. Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • P. Heremans
  • H. Thienpont
  • I. Veretennicoff
Experimental demonstration of free space intrachip micro-optical interconnect
  • 1997
Contribution
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • H. Thienpont
  • I. Veretennicoff
  • B. Dhoedt
  • R. Baets
Optical performance analysis of free-space and guided-wave optical pathway blocks for intra-MCM interconnects
  • 1997
Contribution
  • P. Vynck
  • P. Tuteleers
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • H. Thienpont
  • I. Veretennicoff
Technological aspects of deep proton lithography for the fabrication of micro-optical elements
  • 1997
Book
  • Maria Kufner
  • S. Kufner
Micro-optics and lithography
  • 1997
"This book is a thorough review of current techniques for the fabrication of micro-optical elements. It gives an overview of diffractive and refractive micro-optics and includes also guided wave micro-optics. Special attention is given to new techniques including deep etch lithography, like excimer lasers, LIGA and high energy ion irradiation." "The book is of interest for all scientists in both industry and academia who are working in the field of compact micro-optical systems. This includes optical data transmission in waveguides and free-space, compact optical imaging systems and many other areas of optical engineering." "Graduate students will also find it a very useful introduction to this large and rapidly expanding field. It covers major techniques and describes methods for each, providing much 'how-to-do' information."--BOOK JACKET.
Contribution
  • P. Vynck
  • P. Tuteleers
  • H. Ottevaere
  • V. Baukens
  • G. Verschaffelt
  • S. Kufner
  • Maria Kufner
  • A. Hermanne
  • H. Thienpont
  • I. Veretennicoff
Technological aspects of deep proton lithography for the fabrication of micro-optical elements
  • 1997
Contribution
  • V. Baukens
  • G. Verschaffelt
  • P. Tuteleers
  • P. Vynck
  • H. Ottevaere
  • Maria Kufner
  • S. Kufner
  • H. Thienpont
  • I. Veretennicoff
  • B. Dhoedt
  • R. Baets
Optical performance analysis of free-space and guided-wave optical pathway blocks for intra-MCM interconnects
  • 1997
Contribution
  • G. Verschaffelt
  • R. Buczynski
  • P. Tuteleers
  • P. Vynck
  • V. Baukens
  • Maria Kufner
  • S. Kufner
  • A. Hermanne
  • J. Genoe
  • D. Coppée
  • R. Vounckx
  • P. Heremans
  • H. Thienpont
  • I. Veretennicoff
Experimental demonstration of free space intrachip micro-optical interconnect
  • 1997
Book
  • Maria Kufner
  • S. Kufner
Micro-optics and lithography
  • 1997
"This book is a thorough review of current techniques for the fabrication of micro-optical elements. It gives an overview of diffractive and refractive micro-optics and includes also guided wave micro-optics. Special attention is given to new techniques including deep etch lithography, like excimer lasers, LIGA and high energy ion irradiation." "The book is of interest for all scientists in both industry and academia who are working in the field of compact micro-optical systems. This includes optical data transmission in waveguides and free-space, compact optical imaging systems and many other areas of optical engineering." "Graduate students will also find it a very useful introduction to this large and rapidly expanding field. It covers major techniques and describes methods for each, providing much 'how-to-do' information."--BOOK JACKET.
Contribution
  • S. Kufner
  • Maria Kufner
  • G. Verschaffelt
  • K. Praet
  • V. Baukens
  • P. Tuteleers
  • P. Vynck
  • H. Thienpont
  • I. Veretennicoff
Intrachip interconnect with a monolithic free space optical bridge
  • 1996
JournalArticle
  • S. Lazare
  • J. Lopez
  • J.-M. Turlet
  • Maria Kufner
  • S. Kufner
  • P. Chavel
Microlenses fabricated by UV excimer laser irradiation of PMMA followed by styrene diffusion , vol35
  • 1996

DOI: 10.1364/AO.35.004471

A new technique of microlens array fabrication based on the use of excimer laser radiation is described. Poly(methyl methacrylate) (PMMA) substrates are treated with many low-energy KrF laser pulses and exposed to styrene vapor. The irradiated material swells, producing spherical microlenses that are stabilized by UV polymerization. The chemistry of this process and the optical quality of the lenses are discussed.
Contribution
  • H. Thienpont
  • A. Kirk
  • A. Goulet
  • S. Kufner
  • Maria Kufner
  • N. Nieuborg
  • M. Kuijk
  • R. Vounckx
  • P. Heremans
  • G. Borghs
  • I. Veretennicoff
Optoelectronic subsystems for information processing with PnpN optical thyristors
  • 1996
Contribution
  • Maria Kufner
  • S. Kufner
Monolithische Integration von Mikromechanik und Mikrooptik für optische Kurzstreckenverbindungen
  • 1996
Contribution
  • S. Kufner
  • Maria Kufner
  • G. Verschaffelt
  • K. Praet
  • V. Baukens
  • P. Tuteleers
  • P. Vynck
  • H. Thienpont
  • I. Veretennicoff
Intrachip interconnect with a monolithic free space optical bridge
  • 1996
JournalArticle
  • Maria Kufner
  • S. Kufner
  • P. Chavel
Irradiation protonique en volume: un outil pour la fabrication de composants micro-optique
  • 1996
JournalArticle
  • Maria Kufner
  • S. Kufner
  • P. Chavel
Irradiation protonique en volume: un outil pour la fabrication de composants micro-optique
  • 1996
Contribution
  • Maria Kufner
  • S. Kufner
Monolithische Integration von Mikromechanik und Mikrooptik für optische Kurzstreckenverbindungen
  • 1996
JournalArticle
  • S. Lazare
  • J. Lopez
  • J.-M. Turlet
  • Maria Kufner
  • S. Kufner
  • P. Chavel
Microlenses fabricated by UV excimer laser irradiation of PMMA followed by styrene diffusion , vol35
  • 1996

DOI: 10.1364/AO.35.004471

A new technique of microlens array fabrication based on the use of excimer laser radiation is described. Poly(methyl methacrylate) (PMMA) substrates are treated with many low-energy KrF laser pulses and exposed to styrene vapor. The irradiated material swells, producing spherical microlenses that are stabilized by UV polymerization. The chemistry of this process and the optical quality of the lenses are discussed.
Contribution
  • H. Thienpont
  • A. Kirk
  • A. Goulet
  • S. Kufner
  • Maria Kufner
  • N. Nieuborg
  • M. Kuijk
  • R. Vounckx
  • P. Heremans
  • G. Borghs
  • I. Veretennicoff
Optoelectronic subsystems for information processing with PnpN optical thyristors
  • 1996
Contribution
  • Maria Kufner
  • S. Kufner
  • P. Lalanne
  • P. Pichon
  • P. Chavel
Integration of microlens and fiber holder arrays by deep proton irradiation
  • 1995
JournalArticle
  • Maria Kufner
  • S. Kufner
  • P. Chavel
  • M. Frank
Monolithic integration of microlens arrays and fiber holder arrays in PMMA with fiber selfcentering , vol20
  • 1995

DOI: 10.1364/OL.20.000276

For many fiber applications the precise spacing from one fiber to another and the collimation of the outgoing light are important subjects. In the case of three-dimensional arrangements, such as fiber arrays, the complexity increases. The method of proton irradiation of poly(methyl methacrylate) permits the fabrication of slightly fan-shaped fiber holder arrays that can correct inhomogeneities of the fiber diameters in the micrometer range. Even a three-dimensional monolithic integration of fiber holders and corresponding microlenses can be achieved.
Contribution
  • Maria Kufner
  • S. Kufner
  • P. Pichon
  • P. Chavel
  • M. Frank
Refractive Microprisms with Improved Surface Quality by Proton Polishing
  • 1995
Contribution
  • Maria Kufner
  • S. Kufner
  • P. Lalanne
  • P. Pichon
  • P. Chavel
Integration of microlens and fiber holder arrays by deep proton irradiation
  • 1995
Contribution
  • Maria Kufner
  • S. Kufner
  • H. Thienpont
  • P. Pichon
  • P. Chavel
High quality flat surfaces in refractive microoptics fabricated by deep proton irradiation
  • 1995
Contribution
  • Maria Kufner
  • S. Kufner
  • S. Lazare
  • P. Pichon
  • P. Chavel
Microlenses in PMMA fabricated by particle or electromagnetic irradiation and monomer diffusion
  • 1995
JournalArticle
  • Maria Kufner
  • S. Kufner
  • P. Chavel
  • M. Frank
Monolithic integration of microlens arrays and fiber holder arrays in PMMA with fiber selfcentering , vol20
  • 1995

DOI: 10.1364/OL.20.000276

For many fiber applications the precise spacing from one fiber to another and the collimation of the outgoing light are important subjects. In the case of three-dimensional arrangements, such as fiber arrays, the complexity increases. The method of proton irradiation of poly(methyl methacrylate) permits the fabrication of slightly fan-shaped fiber holder arrays that can correct inhomogeneities of the fiber diameters in the micrometer range. Even a three-dimensional monolithic integration of fiber holders and corresponding microlenses can be achieved.
Contribution
  • Maria Kufner
  • S. Kufner
  • S. Lazare
  • P. Pichon
  • P. Chavel
Microlenses in PMMA fabricated by particle or electromagnetic irradiation and monomer diffusion
  • 1995
JournalArticle
  • Maria Kufner
  • S. Kufner
Fabrication of monolithic integrated fiber-lens connector arrays by deep proton irradiation , vol2
  • 1995

DOI: 10.1007/BF02739541

Deep proton irradiation in poly (methyl methacrylate) (PMMA) is a fabrication method for monolithic integrated micro optics which offers high stability and interesting autoalignment features. The process consists of three basic steps: irradiation of a PMMA substrate followed by either a development of the irradiated regions or a swelling of the irradiated regions by organic vapor or both applied to different regions. With this technique a variety of elementary refractive microoptical components and monolithically integrated combinations can be fabricated: microlenses, microprisms, beam splitters, fiber connectors with selfaligned microlenses on top of each fiber.
Contribution
  • Maria Kufner
  • S. Kufner
  • P. Pichon
  • P. Chavel
  • M. Frank
Refractive Microprisms with Improved Surface Quality by Proton Polishing
  • 1995
Contribution
  • Maria Kufner
  • S. Kufner
  • H. Thienpont
  • P. Pichon
  • P. Chavel
High quality flat surfaces in refractive microoptics fabricated by deep proton irradiation
  • 1995
JournalArticle
  • Maria Kufner
  • S. Kufner
Fabrication of monolithic integrated fiber-lens connector arrays by deep proton irradiation , vol2
  • 1995

DOI: 10.1007/BF02739541

Deep proton irradiation in poly (methyl methacrylate) (PMMA) is a fabrication method for monolithic integrated micro optics which offers high stability and interesting autoalignment features. The process consists of three basic steps: irradiation of a PMMA substrate followed by either a development of the irradiated regions or a swelling of the irradiated regions by organic vapor or both applied to different regions. With this technique a variety of elementary refractive microoptical components and monolithically integrated combinations can be fabricated: microlenses, microprisms, beam splitters, fiber connectors with selfaligned microlenses on top of each fiber.
Contribution
  • Maria Kufner
  • S. Kufner
  • P. Chavel
  • P. Pichon
Fiber array alignment using deep proton irradiation
  • 1994
Contribution
  • P. Lalanne
  • Maria Kufner
  • S. Kufner
  • P. Chavel
2D fiber connector based on refractive and diffractive optics for intracomputer communication
  • 1994
Contribution
  • P. Lalanne
  • Maria Kufner
  • S. Kufner
  • P. Chavel
2D fiber connector based on refractive and diffractive optics for intracomputer communication
  • 1994
Contribution
  • Maria Kufner
  • S. Kufner
  • P. Chavel
  • P. Pichon
Fiber array alignment using deep proton irradiation
  • 1994
JournalArticle
  • Maria Kufner
  • S. Kufner
  • M. Frank
  • J. Moisel
  • M. Testorf
Microlenses in PMMA with high relative aperture: A parameter study , vol2
  • 1993

DOI: 10.1088/0963-9659/2/1/003

Microlenses with high relative apertures can be fabricated in polymethyl methacrylate by irradiation with a high energy proton beam and diffusion of monomer vapour into the irradiated domains. The most important process parameters are characterized and their effect on the shape of the lenses is discussed.
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • M. Testorf
Microlenses in PMMA with high relative aperture; fabricated by proton irradiation combined with monomer diffusion
  • 1993

DOI: 10.1007/978-3-642-78140-7_7

A miniaturization of refractive optical elements is interesting for various applications including 3D-integrated optical systems. In these concepts the typical functions of microlenses like image formation and collimation of light are required. In most fabrication techniques for microlenses there is a trade off between the lens size and the achievable range of focal length. A new fabrication method for microlenses with high relative apertures over a wide range of diameter sizes in polymethyl methacrylate (PMMA) by irradiation with a high energy proton beam and diffusion of monomer vapor in the irradiated domains is reported in [1].
JournalArticle
  • K.-H. Brenner
  • Maria Kufner
  • S. Kufner
  • J. Moisel
  • A. Müller
  • S. Sinzinger
  • M. Testorf
  • J. Göttert
  • J. Mohr
Application of three-dimensional micro-optical components formed by lithography, electroforming, and plastic molding , vol3232
  • 1993

DOI: 10.1364/AO.32.006464

Micro-optics is usually associated with planar waveguides or integrated optical circuits. In this case the propagation of light is restricted to one or two dimensions, and the three-dimensional nature of light propagation is disregarded. We present a method of fabricating three-dimensional micro-optical components by the so-called LIGA process, a lithography, electroforming, and plastic molding process in which poly(methyl methacrylate) is structured by high-energy synchrotron radiation. We demonstrate an experimental system of image formation that uses microprisms and microlenses for a three-dimensional microintegration of optical components.
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • A. Müller
Deep proton irradiation of PMMA for a 3D integration of micro-optical components
  • 1993
An integration of microoptical components to threedimensional systems is of interest for optical information processing as well as for optical interconnections. Polymethyl methacrylate (PMMA) is a suitable substrate material, because microprisms, beamsplitters and microlenses can be integrated monolithically in the same substrate by deep proton irradiation. The microcomponents can be combined to compact microoptical imaging systems which are easy to align. The fabrication method and the imaging properties of this system are discussed and applications are outlined.
Contribution
  • Maria Kufner
  • S. Kufner
Microlenses in PMMA by deep proton irradiation - capacity of the process , volMicrolens Arrays Vol
  • 1993
Contribution
  • Maria Kufner
  • S. Kufner
Microlenses in PMMA by deep proton irradiation - capacity of the process , volMicrolens Arrays Vol
  • 1993
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • M. Testorf
Microlenses in PMMA with high relative aperture; fabricated by proton irradiation combined with monomer diffusion
  • 1993

DOI: 10.1007/978-3-642-78140-7_7

A miniaturization of refractive optical elements is interesting for various applications including 3D-integrated optical systems. In these concepts the typical functions of microlenses like image formation and collimation of light are required. In most fabrication techniques for microlenses there is a trade off between the lens size and the achievable range of focal length. A new fabrication method for microlenses with high relative apertures over a wide range of diameter sizes in polymethyl methacrylate (PMMA) by irradiation with a high energy proton beam and diffusion of monomer vapor in the irradiated domains is reported in [1].
Thesis
  • Maria Kufner
Fabrication and characterization of micro-lenses with high numerical apertures in PMMA Dissertation
  • 1993
JournalArticle
  • S. Kufner
  • Maria Kufner
  • M. Frank
  • A. Müller
  • K.-H. Brenner
3D integration of refractive microoptical components by deep proton irradiation , vol2
  • 1993

DOI: 10.1088/0963-9659/2/2/004

An integration of microoptical components to three-dimensional systems is of interest for optical information processing as well as for optical interconnections. Polymethyl methacrylate (PMMA) is a suitable substrate material, because microprisms, beamsplitters and microlenses can be integrated monolithically in the same substrate by deep proton irradiation. The microcomponents can be combined to compact microoptical imaging systems which are easy to align. The fabrication method and the imaging properties of this system are discussed.
Contribution
  • Maria Kufner
  • S. Kufner
  • M. Frank
Monolithically integrated refractive optical interconnection networks”, Miniature and Micro-Optics and Micromechanics
  • 1993
JournalArticle
  • Maria Kufner
  • S. Kufner
  • M. Frank
  • J. Moisel
  • M. Testorf
Microlenses in PMMA with high relative aperture: A parameter study , vol2
  • 1993

DOI: 10.1088/0963-9659/2/1/003

Microlenses with high relative apertures can be fabricated in polymethyl methacrylate by irradiation with a high energy proton beam and diffusion of monomer vapour into the irradiated domains. The most important process parameters are characterized and their effect on the shape of the lenses is discussed.
Contribution
  • Maria Kufner
  • S. Kufner
  • M. Frank
Monolithically integrated refractive optical interconnection networks”, Miniature and Micro-Optics and Micromechanics
  • 1993
Thesis
  • Maria Kufner
Fabrication and characterization of micro-lenses with high numerical apertures in PMMA Dissertation
  • 1993
JournalArticle
  • S. Kufner
  • Maria Kufner
  • M. Frank
  • A. Müller
  • K.-H. Brenner
3D integration of refractive microoptical components by deep proton irradiation , vol2
  • 1993

DOI: 10.1088/0963-9659/2/2/004

An integration of microoptical components to three-dimensional systems is of interest for optical information processing as well as for optical interconnections. Polymethyl methacrylate (PMMA) is a suitable substrate material, because microprisms, beamsplitters and microlenses can be integrated monolithically in the same substrate by deep proton irradiation. The microcomponents can be combined to compact microoptical imaging systems which are easy to align. The fabrication method and the imaging properties of this system are discussed.
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • A. Müller
Deep proton irradiation of PMMA for a 3D integration of micro-optical components
  • 1993
An integration of microoptical components to threedimensional systems is of interest for optical information processing as well as for optical interconnections. Polymethyl methacrylate (PMMA) is a suitable substrate material, because microprisms, beamsplitters and microlenses can be integrated monolithically in the same substrate by deep proton irradiation. The microcomponents can be combined to compact microoptical imaging systems which are easy to align. The fabrication method and the imaging properties of this system are discussed and applications are outlined.
JournalArticle
  • K.-H. Brenner
  • Maria Kufner
  • S. Kufner
  • J. Moisel
  • A. Müller
  • S. Sinzinger
  • M. Testorf
  • J. Göttert
  • J. Mohr
Application of three-dimensional micro-optical components formed by lithography, electroforming, and plastic molding , vol3232
  • 1993

DOI: 10.1364/AO.32.006464

Micro-optics is usually associated with planar waveguides or integrated optical circuits. In this case the propagation of light is restricted to one or two dimensions, and the three-dimensional nature of light propagation is disregarded. We present a method of fabricating three-dimensional micro-optical components by the so-called LIGA process, a lithography, electroforming, and plastic molding process in which poly(methyl methacrylate) is structured by high-energy synchrotron radiation. We demonstrate an experimental system of image formation that uses microprisms and microlenses for a three-dimensional microintegration of optical components.
Contribution
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • M. Testorf
A fabrication method for microlenses with high relative apertures in PMMA
  • 1992
UnpublishedWork
  • J. Götte
  • A. El-Kholi
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • J. Mohr
Untersuchungen zur tiefenlithographischen Strukturierung von PMMA KfK-Primärbericht Nr. 41.01.03.P.02 A
  • 1992
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
A new monolithic integration method for microprisms, microbeamsplitters and microlenses in PMMA
  • 1992
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • J. Moisel
  • A. Müller
  • S. Sinzinger
  • M. Testorf
  • J. Göttert
  • J. Mohr
Microoptical setup with microlenses and microprisms based on refractive optics
  • 1992
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
A new monolithic integration method for microprisms, microbeamsplitters and microlenses in PMMA
  • 1992
UnpublishedWork
  • J. Götte
  • A. El-Kholi
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • J. Mohr
Untersuchungen zur tiefenlithographischen Strukturierung von PMMA KfK-Primärbericht Nr. 41.01.03.P.02 A
  • 1992
Contribution
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • M. Testorf
A fabrication method for microlenses with high relative apertures in PMMA
  • 1992
Contribution
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • J. Moisel
  • A. Müller
  • S. Sinzinger
  • M. Testorf
  • J. Göttert
  • J. Mohr
Microoptical setup with microlenses and microprisms based on refractive optics
  • 1992
JournalArticle
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • M. Testorf
Microlenses in polymethyl methacrylate with high relative aperture , vol30
  • 1991

DOI: 10.1364/AO.30.002666

Lens arrays with relative apertures as high as 1 can be fabricated in polymethyl methacrylate with a high-energy H+b eam and diffusion of styrene in the irradiatedd omains.
JournalArticle
  • M. Frank
  • Maria Kufner
  • S. Kufner
  • M. Testorf
Microlenses in polymethyl methacrylate with high relative aperture , vol30
  • 1991

DOI: 10.1364/AO.30.002666

Lens arrays with relative apertures as high as 1 can be fabricated in polymethyl methacrylate with a high-energy H+b eam and diffusion of styrene in the irradiatedd omains.
JournalArticle
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
H+-Lithography for 3-D integration of optical circuits , vol29
  • 1990

DOI: 10.1364/AO.29.003723

Optical structures in polymethylmethacrylate can be generated with a high energy H+ beam. The depth of the structures is up to 1 mm. We describe this new technique and demonstrate first results.
JournalArticle
  • K.-H. Brenner
  • Maria Kufner
  • S. Kufner
Highly parallel arithmetic algorithms for a digital optical processor using symbolic substitution logic , vol29
  • 1990

DOI: 10.1364/AO.29.001610

Symbolic substitution logic is a powerful tool for realizing optical arithmetic in a digital optical processor, because it is matched to the parallelism of optics and to the properties of optical switching devices. Working with such processor enables the use of very efficient parallel algorithms. We have investigated the implemention of the basic arithmetic operations: addition, subtraction, multiplication, and division.
JournalArticle
  • K.-H. Brenner
  • M. Frank
  • Maria Kufner
  • S. Kufner
H+-Lithography for 3-D integration of optical circuits , vol29
  • 1990

DOI: 10.1364/AO.29.003723

Optical structures in polymethylmethacrylate can be generated with a high energy H+ beam. The depth of the structures is up to 1 mm. We describe this new technique and demonstrate first results.
JournalArticle
  • K.-H. Brenner
  • Maria Kufner
  • S. Kufner
Highly parallel arithmetic algorithms for a digital optical processor using symbolic substitution logic , vol29
  • 1990

DOI: 10.1364/AO.29.001610

Symbolic substitution logic is a powerful tool for realizing optical arithmetic in a digital optical processor, because it is matched to the parallelism of optics and to the properties of optical switching devices. Working with such processor enables the use of very efficient parallel algorithms. We have investigated the implemention of the basic arithmetic operations: addition, subtraction, multiplication, and division.
Contribution
  • D. Fey
  • Maria Kufner
  • S. Kufner
  • G. Trabold
  • M. Trabold
Design and simulation of optical architectures
  • 1990
Contribution
  • D. Fey
  • Maria Kufner
  • S. Kufner
  • G. Trabold
  • M. Trabold
Design and simulation of optical architectures
  • 1990
Contribution
  • K.-H. Brenner
  • Maria Kufner
  • S. Kufner
  • S. Sinzinger
  • M. Testorf
Application of diffusion and photo- sensitizing techniques in PMMA to optical interconnects
  • 1990

DOI: 10.1117/12.22159

A new technique for the three dimensional integration of optical components is presented. It is based on diffusion techniques and photoinitiated polymerization. Initial experimental results demonstrate the feasibility and efficiency. DIFFUSION jQ PHOTOINITIATED POLYMERISA11ON We want to combine diffusion with photoinitiated polymerization in order to form passive elements which are necessary for three dimensional integration of optical components for microoptical systems1''2. The production of optical elements by photopolymerization consists of two main steps. First the PMMA is sensitized to ultraviolet light by diffusing a photoinitiator into the substrat. Then the exposure by UV light causes an increase in the thickness and in the refractive index. The structuring can be achieved either by local diffusion and global exposure for stabilization or by global diffusion and local exposure. In the first case metal-masks for the diffusion process are necessary whereas in the second case photo-masks can be used. OPTICAL INTERCONNECFION For realizing a flexible optical interconnection plate3''4 the necessary functions are: light collimation light deflection and beam splitting. Collimation can be achieved by microlenses. For deflection we use a miniaturized prism. For beam splitting an index grating can be used. The components are integrated within a planar PMMA plate. EXPERIMENTAL RESULTS By measuring the phase profile of diffused lenses and prisms we demonstrated that phase shifts of several wavelengths can be achieved by polymerization and diffusion techniques. The main effect results from the
Contribution
  • K.-H. Brenner
  • Maria Kufner
  • S. Kufner
  • S. Sinzinger
  • M. Testorf
Application of diffusion and photo- sensitizing techniques in PMMA to optical interconnects
  • 1990

DOI: 10.1117/12.22159

A new technique for the three dimensional integration of optical components is presented. It is based on diffusion techniques and photoinitiated polymerization. Initial experimental results demonstrate the feasibility and efficiency. DIFFUSION jQ PHOTOINITIATED POLYMERISA11ON We want to combine diffusion with photoinitiated polymerization in order to form passive elements which are necessary for three dimensional integration of optical components for microoptical systems1''2. The production of optical elements by photopolymerization consists of two main steps. First the PMMA is sensitized to ultraviolet light by diffusing a photoinitiator into the substrat. Then the exposure by UV light causes an increase in the thickness and in the refractive index. The structuring can be achieved either by local diffusion and global exposure for stabilization or by global diffusion and local exposure. In the first case metal-masks for the diffusion process are necessary whereas in the second case photo-masks can be used. OPTICAL INTERCONNECFION For realizing a flexible optical interconnection plate3''4 the necessary functions are: light collimation light deflection and beam splitting. Collimation can be achieved by microlenses. For deflection we use a miniaturized prism. For beam splitting an index grating can be used. The components are integrated within a planar PMMA plate. EXPERIMENTAL RESULTS By measuring the phase profile of diffused lenses and prisms we demonstrated that phase shifts of several wavelengths can be achieved by polymerization and diffusion techniques. The main effect results from the

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  • Sensorik
  • Mikrosystemtechnik
  • Mikrooptik
  • optische Messtechnik
  • Optik Design